Automation Network Dresden singles out user-oriented interface for functional operation of modern deposition systems
Aixtron Ltd
World's leading manufacturer of MOCVD equipment. AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry.
Telephone: +44 (0)1223 519 444
Address: Buckingway Business Park Swavesey
Post Code: CB24 4FQ
Country: United Kingdom
Website: http://www.aixtron.com
Membership Type: Corporate 51+
AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry. The Company's technology solutions are used by a diverse range of customers worldwide to build advanced components for electronic and opto-electronic applications based on compound, silicon, or organic semiconductor materials and more recently carbon nanostructures. Such components are used in display technology, signal and lighting technology, fiber communication networks, wireless and cell telephony applications, optical and electronic data storage, computer technology as well as a wide range of other high-tech applications. AIXTRON AG’s securities are listed on the Frankfurt Stock Exchange and, in form of American Depositary Shares (ADS), on the Global Market of the NASDAQ Stock Market, and are included in the TecDAX index, the NASDAQ Composite Index, the MSCI World Small Cap Index, the Nature Stock Index (NAI) and the Dow Jones Stoxx 600. Founded in 1983, the Company is headquartered in Herzogenrath, Germany.
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AIXTRON SE, a worldwide leading provider of deposition equipment to the semiconductor industry, today announced that it has received a multiple tool order for its new AIX R6 MOCVD system.
19-05-2015
AIXTRON SE, a worldwide leading provider of deposition equipment to the semiconductor industry, today announced that Nano Carbon (Poland) has ordered AIXTRON’s AIX G5 WW reactor for graphene production on silicon carbide. Nano Carbon owns a low-cost patented technique for epitaxial graphene that can be implemented on the AIXTRON system.
19-03-2015
AIXTRON SE, a worldwide leading provider of deposition equipment to the semiconductor industry, today announced that Taiwanese group Episil Semiconductor Wafer, Inc. has successfully put into operation an AIX G5 WW (Warm-Wall) reactor for silicon carbide (SiC) epitaxy.
03-03-2015
Key focus remains on customers, growth fields and efficiency enhancement
08-01-2015
AIXTRON hosts well-attended MOCVD Seminar on recent technology developments and successfully introduces new AIX R6.
28-11-2014
AIXTRON has been recognised for its contributions to the establishment of the international Solid State Lighting (SSL) industry.
10-11-2014
AIXTRON’s next generation MOCVD tool excels through top level production performance, lowest cost of ownership and major productivity increase.
07-11-2014
AIXTRON SE, a worldwide leading provider of deposition equipment to the semiconductor industry, announced today that Japanese manufacturer Showa Denko has successfully qualified the company’s most recent system for manufacturing silicon carbide (SiC) epitaxial wafers.
30-10-2014
San’an Optoelectronics expands its production capacity with AIXTRON’s Next Generation tool.
26-09-2014
A new research programme based on the AIXTRON Planetary Reactor AIX G5WW starts at the end of 2014.
11-09-2014
Vishay Semiconductor GmbH, Heilbronn, has acquired an MOCVD system from AIXTRON to expand its infrared LED production capacities. The company aims to substantially extend its product portfolio in this area. The system was delivered to Vishay at the end of March.
01-08-2014
AIXTRON SE, a worldwide leading provider of semiconductor and compound semiconductor deposition equipment and services, announced that it has delivered multi-tool orders for its next generation QXP-8300 ALD systems to a globally leading memory manufacturer.
10-07-2014
AIXTRON SE announced today that King Abdullah University of Science and Technology (KAUST), Saudi Arabia, has ordered an AIX BM plasma-enhanced chemical vapor deposition system for growth of graphene and carbon nanotubes. The reactor, capable of handling 4-inch substrates, will be delivered in the third quarter of 2014.
08-07-2014
Chinese semiconductor specialist Enkris Semiconductor, Inc. has successfully demonstrated the manufacture of high voltage Gallium Nitride HEMT (High Electron Mobility Transistor) structures on 200 mm Silicon (GaN-on-Si) with an AIXTRON tool.
03-07-2014
Finisar Corporation has ordered an AIXTRON AIX 2800G4-TM MOCVD system. The company intends to apply this tool to the design and manufacture of tunable lasers, high speed modulators, and photonic integrated circuits (PICs) in its Sweden facility.
25-06-2014
AIXTRON SE, one of the world’s leading manufacturers of deposition systems for the semiconductor industry, has obtained certification under international standard DIN EN ISO 50001 for the introduction of its new energy management system. AIXTRON is thus one of an ever growing number of companies subjecting their energy use to systematic control.
18-06-2014
Company prepares for RF data transfer market expansion in 2015 and beyond.
04-06-2014
Plessey Semiconductors Ltd today announced that it has purchased another CRIUS II-XL MOCVD system for use in the manufacture of Gallium Nitride LEDs on Silicon wafers (GaN-on-Si). The company is further expanding its production capacities in this area. The Close Coupled Showerhead system recently delivered with a 7x6-inch configuration will supplement an existing production system from AIXTRON...
27-05-2014
AIXTRON SE has announced that Shanghai University has ordered a BM R&D reactor to be used by its Sino-Sweden Microsystem Integration Technology Center (SMIT). AIXTRON's highly flexible R&D system for manufacturing carbon nanotubes and graphene has already shown excellent results at numerous customer sites worldwide.
21-05-2014
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