AIXTRON SE announced today that King Abdullah University of Science and Technology (KAUST), Saudi Arabia, has ordered an AIX BM plasma-enhanced chemical vapor deposition system for growth of graphene and carbon nanotubes. The reactor, capable of handling 4-inch substrates, will be delivered in the third quarter of 2014.
King Abdullah University explores carbon-nano structures with AIXTRON system
Professor Pedro Da Costa leads the team that will be using the equipment at the KAUST Laboratory for Carbon Nanostructures. “We plan to expand our research in this rapidly growing field with the aim of finding a wide range of new applications,” reports Da Costa. “To support our work, we need the best performing commercial reactor for high quality carbon nanomaterials and have thus selected AIXTRON’s world-leading BM Pro reactor.”
“We are delighted about the first order from KAUST. Our BM Pro system is based upon the showerhead, vertical flow concept which delivers both uniformity and scalability, rapid heating and plasma-based processing to successfully grow mono and multi-layer graphene and various types of nanotubes at low cost of ownership and maintenance”, says Dr. Frank Schulte, Vice President AIXTRON Europe.
The AIXTRON BM system range supports substrate diameters from 50 mm (2-inch) up to 300 mm. Proprietary showerhead, heater and plasma technology ensures users to benefit from high uniformity, scalability, repeatability and excellent film quality.
World's leading manufacturer of MOCVD equipment. AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry.