MOCVD, CVD, ALD precursors for use in micro & nano electronics available from Strem

Nano layers of metals, semiconducting and dielectric materials are crucial components of modern electronic devices, high-efficiency solar panels, memory systems, computer chips and a broad variety of high-performance tools.

 

 Strem Chemicals UK provides high-quality purified precursors for research in semiconductor and thin film research and development, such as Atomic Layer Deposition (ALD),  Chemical Vapour Deposition (CVD), and Metal Oxide Chemical Vapour Deposition (MOCVD), which is a technique for depositing thin layers of atoms onto a semiconductor wafer. Using MOCVD you can build up many layers, each of a precisely controlled thickness, to create a material which has specific optical and electrical properties.

 Strem's 50 years of experience in the manufacture of inorganic and organometallic chemicals has allowed it to expand its product range. It is continually adding new products for this dynamic and exciting field and has a huge stock in the UK.

The range of products includes:

 
The technique of choice for depositing nano-films on various surfaces is Atomic Layer Deposition (ALD), which uses consecutive chemical reactions on a material’s surface to create nanostructures with predetermined thickness and chemical composition

Strem UK can also offer high-quality precursors for ALD safely packaged in steel cylinders suitable for use with a variety of deposition systems.

Important classes of precursors include amides, alkoxides, diketonates and organometallics,

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